Every year you can apply for a residency for 6 to 12 months at the Jan van Eyck Academie. The annual call for applications is open from July–October.
Artists, designers, architects, landscape architects, curators, critics, fashion designers, writers are invited to apply. Apply if you need the time and space that is needed to develop your talents, to discover as yet unexplored perspectives and delve into deeper layers of yourself. Every applicant shares our belief that insight comes through exchange with other: insight in the meaning of things, in your own practice, in the (art) world. The multiform character of the Van Eyck appeals to the artistic and intellectual versatility of the artists and enables them to deepen and ramify their talents and skills in the short and long run. The work of the artists testifies to an art practice that is investigative and committed.
— A residency at the Jan van Eyck Academie varies between 6–12 months. A residency can start from April to September 2019. The starting date of your residency is determined by the Van Eyck.
— 32 up to 35 spots are available each year.
— Participants are generally between 22–41 years of age
— The registration fee is €70
— The enrolment fee at the Van Eyck amounts to €2,750 at an annual basis. For stays that are shorter or longer than 12 months, pro rata amounts apply (so for example 6 months = €1,375). The enrolment fee should be paid before 21 January 2019
— Participants receive a monthly stipend of €900 and a working budget of €2,000 annually.
— Duo’s or collectives can apply with 1 project proposal for 1 residency at the Van Eyck. When selected they will share 1 studio and 1 stipend. In that case the enrolment fee has to be paid only once.
— Participants are expected to settle in Maastricht or direct surroundings (in a radius of 10 km) during their stay at the Van Eyck.
— Artists who previously have been in resident at another post academic institute (Rijksakademie, De Ateliers, BAK) in the Netherlands, cannot apply for a work period at the Van Eyck.